The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
- Title
- The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
- Authors
- 김형준
- Date Issued
- 2002-04-01
- Publisher
- Material Research Society
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/75485
- Article Type
- Conference
- Citation
- Mat. Res. Soc., 2002-04-01
- Files in This Item:
- There are no files associated with this item.
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