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dc.contributor.author강인석-
dc.date.accessioned2018-06-21T06:10:20Z-
dc.date.available2018-06-21T06:10:20Z-
dc.date.created2009-03-27-
dc.date.issued2001-04-01-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/75905-
dc.publisherTheories and Applications of Chem. Eng.-
dc.relation.isPartOfTheories and Applications of Chemical Engineering-
dc.relation.isPartOfTheories and Applications of Chem. Eng-
dc.titleOptimization of surface temperature distribution for point defects control in the silicon single crystal by using the variational principle-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitationTheories and Applications of Chemical Engineering, pp.481 - 484-
dc.citation.conferencePlaceKO-
dc.citation.endPage484-
dc.citation.startPage481-
dc.citation.titleTheories and Applications of Chemical Engineering-
dc.contributor.affiliatedAuthor강인석-
dc.description.journalClass2-
dc.description.journalClass2-

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Dept. of Chemical Enginrg
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