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He/O2 플라즈마 전처리를 통한 산화막 계면 특성 개선 효과

Title
He/O2 플라즈마 전처리를 통한 산화막 계면 특성 개선 효과
Authors
이시우
Date Issued
2000-10-20
Publisher
한국화학공학회
URI
https://oasis.postech.ac.kr/handle/2014.oak/76174
Article Type
Conference
Citation
한국화학공학회지, page. 4689, 2000-10-20
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