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The application of ALD for metallization of 65nm and beyond

Title
The application of ALD for metallization of 65nm and beyond
Authors
김형준
Date Issued
2004-11-01
Publisher
Asian Conference on Chemical Vapor Deposition
URI
https://oasis.postech.ac.kr/handle/2014.oak/76832
Article Type
Conference
Citation
The 3rd Asian Conference on Chemical Vapor Deposition, 2004-11-01
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김형준KIM, HYUNGJUN
Dept of Materials Science & Enginrg
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