The application of ALD for metallization of 65nm and beyond
- Title
- The application of ALD for metallization of 65nm and beyond
- Authors
- 김형준
- Date Issued
- 2004-11-01
- Publisher
- Asian Conference on Chemical Vapor Deposition
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/76832
- Article Type
- Conference
- Citation
- The 3rd Asian Conference on Chemical Vapor Deposition, 2004-11-01
- Files in This Item:
- There are no files associated with this item.
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