Conference
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 이시우 | - |
| dc.date.accessioned | 2018-06-21T07:30:55Z | - |
| dc.date.available | 2018-06-21T07:30:55Z | - |
| dc.date.created | 2009-03-27 | - |
| dc.date.issued | 2003-01-01 | - |
| dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/77047 | - |
| dc.publisher | The Electrochem. Soc | - |
| dc.relation.isPartOf | Proc. of the 203rd Int. Conf. on CVD and EUROCVD | - |
| dc.relation.isPartOf | Proc. of the 203rd Int. Conf. on CVD and EUROCVD | - |
| dc.title | Copper Dots Deposition Using New Precursors [Cu(I)(hfac)]2(DVTMSO) and [Cu(I)(hfac)]2(HD) | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.identifier.bibliographicCitation | Proc. of the 203rd Int. Conf. on CVD and EUROCVD, pp.1305 | - |
| dc.citation.conferenceDate | 2003-04-27 | - |
| dc.citation.conferencePlace | FR | - |
| dc.citation.startPage | 1305 | - |
| dc.citation.title | Proc. of the 203rd Int. Conf. on CVD and EUROCVD | - |
| dc.contributor.affiliatedAuthor | 이시우 | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalClass | 1 | - |
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