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MOCVD of ZrO2 Thin Film using Zr(DMAE)4 as a precursor for High-k Dielectrics

Title
MOCVD of ZrO2 Thin Film using Zr(DMAE)4 as a precursor for High-k Dielectrics
Authors
이시우
Date Issued
2000-10-27
Publisher
대한금속재료학회
URI
https://oasis.postech.ac.kr/handle/2014.oak/77423
Article Type
Conference
Citation
대한금속재료학회, page. 238, 2000-10-27
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