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Residual Stress Behavior in Methylsilsesquioxane-Based Dielectric Thin Films
- Title
- Residual Stress Behavior in Methylsilsesquioxane-Based Dielectric Thin Films
- Authors
- 이문호
- Date Issued
- 2000-07-09
- Publisher
- Hanyang University, Seoul, Korea
- Article Type
- Conference
- Citation
- The 3rd Asian Symposium on Organized Molecular Films for Electronics and Photonics, page. 220 - 220, 2000-07-09
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Related Researcher
- 이문호REE, MOONHOR
- Dept of Chemistry