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dc.contributor.author김동언en_US
dc.date.accessioned2014-12-01T11:46:41Z-
dc.date.available2014-12-01T11:46:41Z-
dc.date.issued2010en_US
dc.identifier.otherOAK-2014-00272en_US
dc.identifier.urihttp://postech.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000000578950en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/774-
dc.descriptionMasteren_US
dc.description.abstractIn this paper, we compared kinetics of VLS growth and VSS growth of group IV semiconductor nanowires. By using Cu as solid catalyst, we can synthesize Si and Ge nanowires below their Eutectic temperature. We discovered that activation energies for nanowires growth by solid-catalytic growth are higher than by liquid-catalytic growth. From kinetics analysis, we suppose that diffusion of Si or Ge atoms through catalysts is not rate-limiting step but surface chemical reaction of precursors or incorporation of Si or Ge adatoms.en_US
dc.languagekoren_US
dc.publisher포항공과대학교en_US
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.title구리촉매를 이용한 4족 원소 나노선의 고상촉매합성법en_US
dc.title.alternativeSolid-Catalytic Growth of Group IV Semiconductor Nanowires: The Case of Cu Catalystsen_US
dc.typeThesisen_US
dc.contributor.college일반대학원 신소재공학과en_US
dc.date.degree2010- 2en_US
dc.type.docTypeThesis-

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