Effect of low temperature deuterium annealing on plasma-process induced damage
- Title
- Effect of low temperature deuterium annealing on plasma-process induced damage
- Authors
- 강봉구
- Date Issued
- 1999-05-10
- Publisher
- The 4th International Symposium on Plasma-Process Induced Damage
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/77966
- Article Type
- Conference
- Citation
- The 4th International Symposium on Plasma-Process Induced Damage, page. 188 - 191, 1999-05-10
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- There are no files associated with this item.
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