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Issues and technical enablers for nanoscale devices beyond 45 nm: ALD of metal nanofilms

Title
Issues and technical enablers for nanoscale devices beyond 45 nm: ALD of metal nanofilms
Authors
김형준
Date Issued
2005-06-01
URI
https://oasis.postech.ac.kr/handle/2014.oak/78917
Article Type
Conference
Citation
The 1st workshop, Korean Atomic layer deposition society, 2005-06-01
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김형준KIM, HYUNGJUN
Dept of Materials Science & Enginrg
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