Issues and technical enablers for nanoscale devices beyond 45 nm: ALD of metal nanofilms
- Title
- Issues and technical enablers for nanoscale devices beyond 45 nm: ALD of metal nanofilms
- Authors
- 김형준
- Date Issued
- 2005-06-01
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/78917
- Article Type
- Conference
- Citation
- The 1st workshop, Korean Atomic layer deposition society, 2005-06-01
- Files in This Item:
- There are no files associated with this item.
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