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Residual Stress Behavior in Dielectric Thin Films Obtained from Silsesquioxane Precursors

Title
Residual Stress Behavior in Dielectric Thin Films Obtained from Silsesquioxane Precursors
Authors
이문호
Date Issued
2000-04-14
Publisher
Poly.Soc.Korea
URI
https://oasis.postech.ac.kr/handle/2014.oak/79351
Article Type
Conference
Citation
Polymer Society of Korea - Spring Meeting, page. 37 - 37, 2000-04-14
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이문호REE, MOONHOR
Dept of Chemistry
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