Residual Stress Behavior in Dielectric Thin Films Obtained from Silsesquioxane Precursors
- Title
- Residual Stress Behavior in Dielectric Thin Films Obtained from Silsesquioxane Precursors
- Authors
- 이문호
- Date Issued
- 2000-04-14
- Publisher
- Poly.Soc.Korea
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/79351
- Article Type
- Conference
- Citation
- Polymer Society of Korea - Spring Meeting, page. 37 - 37, 2000-04-14
- Files in This Item:
- There are no files associated with this item.
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