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Analysis of Charge-up Effects in CCPs and Chargeup-Free Neutral Beam Etching by PIC Simulation

Title
Analysis of Charge-up Effects in CCPs and Chargeup-Free Neutral Beam Etching by PIC Simulation
Authors
이재구
Date Issued
2004-06-01
URI
https://oasis.postech.ac.kr/handle/2014.oak/81115
Article Type
Conference
Citation
7th Asia Pacific Conference on Plasma Science and Technology(APCPST), 2004-06-01
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