Characterization of deep levels in oxygen implanted silicon wafers by capacitive deep level transient spectroscopy
- Title
- Characterization of deep levels in oxygen implanted silicon wafers by capacitive deep level transient spectroscopy
- Authors
- 강봉구
- Date Issued
- 1997-09-30
- Publisher
- The 1997 Joint International Meeting of the Electrochemical Society
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/81672
- Article Type
- Conference
- Citation
- The 1997 Joint International Meeting of the Electrochemical Society, 1997-09-30
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.