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Characterization of deep levels in oxygen implanted silicon wafers by capacitive deep level transient spectroscopy

Title
Characterization of deep levels in oxygen implanted silicon wafers by capacitive deep level transient spectroscopy
Authors
강봉구
Date Issued
1997-09-30
Publisher
The 1997 Joint International Meeting of the Electrochemical Society
URI
https://oasis.postech.ac.kr/handle/2014.oak/81672
Article Type
Conference
Citation
The 1997 Joint International Meeting of the Electrochemical Society, 1997-09-30
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강봉구KANG, BONG KOO
Dept of Electrical Enginrg
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