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HF:H2O2:CH3COOH 용액을 이용한 실리콘-져마늄 에피막의 화학적 선택 식각
- Title
- HF:H2O2:CH3COOH 용액을 이용한 실리콘-져마늄 에피막의 화학적 선택 식각
- Authors
- 강봉구
- Date Issued
- 1996-01-01
- Publisher
- 전자공학회
- Article Type
- Conference
- Citation
- 전자공학회 추계학술대회, 1996-01-01
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Related Researcher
- 강봉구KANG, BONG KOO
- Dept of Electrical Enginrg