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In-situ FTIR study on the role of surface hydrides and fluorides in low-temperature Si CVD
- Title
- In-situ FTIR study on the role of surface hydrides and fluorides in low-temperature Si CVD
- Authors
- 이시우
- Date Issued
- 1996-01-01
- Publisher
- The Electrochem. Soc.
- Article Type
- Conference
- Citation
- Proc. of the 13th Int. Conf. on CVD, page. 189, 1996-01-01
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