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Effects of Reactive Gases at the ppm Concentration on Film Growth Kinetics, Physical Properties, and Nanostructure: UHV-CVD SiGe(001) and Si1-yCy(001)
- Title
- Effects of Reactive Gases at the ppm Concentration on Film Growth Kinetics, Physical Properties, and Nanostructure: UHV-CVD SiGe(001) and Si1-yCy(001)
- Authors
- 김형준
- Publisher
- IUVSTA
- Article Type
- Conference
- Citation
- IUVSTA Workshop on the Effect of Trace Elements on The Nucleation and Growth of Thin Films
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Related Researcher
- 김형준KIM, HYUNGJUN
- Dept of Materials Science & Enginrg