Co and CoSi2 Films Prepared by Plasma-Enhanced Atomic Layer Deposition for Contact Applications
- Title
- Co and CoSi2 Films Prepared by Plasma-Enhanced Atomic Layer Deposition for Contact Applications
- Authors
- 김형준
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/83766
- Article Type
- Conference
- Citation
- American Vacuum Society 53th International Conference
- Files in This Item:
- There are no files associated with this item.
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