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Evaluation of Plasma Enhanced Atomic Layer Deposition TaN for Metal Gate Electrode Application
- Title
- Evaluation of Plasma Enhanced Atomic Layer Deposition TaN for Metal Gate Electrode Application
- Authors
- 김형준
- Publisher
- American Vacuum Society
- Article Type
- Conference
- Citation
- American Vacuum Society 51th International Conference
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Related Researcher
- 김형준KIM, HYUNGJUN
- Dept of Materials Science & Enginrg