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dc.contributor.author김형준-
dc.date.accessioned2018-06-21T15:04:46Z-
dc.date.available2018-06-21T15:04:46Z-
dc.date.created2009-03-27-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/83917-
dc.publisherVMIC conference proceeding-
dc.relation.isPartOfVMIC conference proceeding-
dc.relation.isPartOfVMIC conference proceeding-
dc.titleAtomic Layer Deposition for Nanoscale Contact Application-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitationVMIC conference proceeding, pp.309-
dc.citation.conferenceDate2008-10-01-
dc.citation.startPage309-
dc.citation.titleVMIC conference proceeding-
dc.contributor.affiliatedAuthor김형준-
dc.description.journalClass1-
dc.description.journalClass1-

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김형준KIM, HYUNGJUN
Dept of Materials Science & Enginrg
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