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Characteristic of the heteroepitaxial SixGe1-x films grown by RTCVD method

Title
Characteristic of the heteroepitaxial SixGe1-x films grown by RTCVD method
Authors
강봉구
Date Issued
1995-01-01
Publisher
2nd Korea-China Sym. on Ion Beam Modification of Materials and Thin Film Materials
URI
https://oasis.postech.ac.kr/handle/2014.oak/84877
Article Type
Conference
Citation
2nd Korea-China Sym. on Ion Beam Modification of Materials and Thin Film Materials, 1995-01-01
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강봉구KANG, BONG KOO
Dept of Electrical Enginrg
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