Conference
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 이시우 | - |
| dc.date.accessioned | 2018-06-23T14:01:44Z | - |
| dc.date.available | 2018-06-23T14:01:44Z | - |
| dc.date.created | 2009-03-27 | - |
| dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/90559 | - |
| dc.publisher | American Vacuum Society | - |
| dc.relation.isPartOf | Atomic Layer Deposition (ALD 2003) | - |
| dc.relation.isPartOf | Atomic Layer Deposition (ALD 2003) | - |
| dc.title | Atomic layer chemical vapor deposition (ALCVD) of hafnium silicate films using HfCl4 and Si(n-OC4H9)4 | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.identifier.bibliographicCitation | Atomic Layer Deposition (ALD 2003) | - |
| dc.citation.conferenceDate | 2005-08-28 | - |
| dc.citation.title | Atomic Layer Deposition (ALD 2003) | - |
| dc.contributor.affiliatedAuthor | 이시우 | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalClass | 1 | - |
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