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Deposition of Yttrium or Lanthanum-substituted Bismuth Titanate Films by DLI-MOCVD for Use in Non-Volatile Memories

Title
Deposition of Yttrium or Lanthanum-substituted Bismuth Titanate Films by DLI-MOCVD for Use in Non-Volatile Memories
Authors
이시우
Publisher
The Electrochem. Soc
URI
https://oasis.postech.ac.kr/handle/2014.oak/91281
Article Type
Conference
Citation
Proc. of the 203rd Int. Conf. on CVD and EUROCVD, page. 1419
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