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Characteristics of Tantalum Carbo-nitride Thin Films Deposited with Atomic Layer Deposition Process

Title
Characteristics of Tantalum Carbo-nitride Thin Films Deposited with Atomic Layer Deposition Process
Authors
이시우
Publisher
Electrochemical Society
URI
https://oasis.postech.ac.kr/handle/2014.oak/91914
Article Type
Conference
Citation
ECS Transactions, page. 227
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