Characteristics of Tantalum Carbo-nitride Thin Films Deposited with Atomic Layer Deposition Process
- Title
- Characteristics of Tantalum Carbo-nitride Thin Films Deposited with Atomic Layer Deposition Process
- Authors
- 이시우
- Publisher
- Electrochemical Society
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/91914
- Article Type
- Conference
- Citation
- ECS Transactions, page. 227
- Files in This Item:
- There are no files associated with this item.
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