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Cited 39 time in webofscience Cited 42 time in scopus
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dc.contributor.authorSong, J-
dc.contributor.authorPrakash, A-
dc.contributor.authorLee, D-
dc.contributor.authorWoo, J-
dc.contributor.authorCha, E-
dc.contributor.authorLee, S-
dc.contributor.authorHwang, H-
dc.date.accessioned2018-10-04T05:51:04Z-
dc.date.available2018-10-04T05:51:04Z-
dc.date.created2015-12-03-
dc.date.issued2015-09-14-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/92363-
dc.description.abstractIn this study, we achieved bidirectional threshold switching (TS) for selector applications in a Ag-Cu2O-based programmable-metallization-cell device by engineering the stack wherein Ag was intentionally incorporated in the oxide (Cu2O) layer by a simple approach comprising co-sputtering and subsequent optimized annealing. The distribution of the Ag was directly confirmed by transmission electron microscopy and energy dispersive spectroscopy line profiling. The observed TS occurred because of the spontaneous self-rupturing of the unstable Ag filament that formed in the oxide layer. (C) 2015 AIP Publishing LLC.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.subjectCUPROUS-OXIDE-
dc.subjectRADICAL OXIDATION-
dc.subjectLOW-TEMPERATURE-
dc.subjectMEMORY-
dc.titleBidirectional threshold switching in engineered multilayer (Cu2O/Ag:Cu2O/Cu2O) stack for cross-point selector application-
dc.typeArticle-
dc.identifier.doi10.1063/1.4931136-
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.107, no.11-
dc.identifier.wosid000361639200053-
dc.date.tcdate2019-02-01-
dc.citation.number11-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume107-
dc.contributor.affiliatedAuthorPrakash, A-
dc.contributor.affiliatedAuthorHwang, H-
dc.identifier.scopusid2-s2.0-84941985561-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc17-
dc.type.docTypeArticle-
dc.subject.keywordPlusCUPROUS-OXIDE-
dc.subject.keywordPlusRADICAL OXIDATION-
dc.subject.keywordPlusLOW-TEMPERATURE-
dc.subject.keywordPlusMEMORY-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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황현상HWANG, HYUNSANG
Dept of Materials Science & Enginrg
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