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Cited 32 time in webofscience Cited 35 time in scopus
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dc.contributor.authorBaik, JM-
dc.contributor.authorShon, Y-
dc.contributor.authorKang, TW-
dc.contributor.authorLee, JL-
dc.date.accessioned2015-06-25T01:11:05Z-
dc.date.available2015-06-25T01:11:05Z-
dc.date.created2009-02-28-
dc.date.issued2004-02-16-
dc.identifier.issn0003-6951-
dc.identifier.other2015-OAK-0000004021en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/9479-
dc.description.abstractN and Mn ions were co-implanted into p-type GaN and subsequently annealed at 700-900degreesC. Compared with Mn-implanted sample, the (Mn+N)-implanted sample revealed a larger ferromagnetic signal. This was attributed to the increase of Ga-Mn magnetic phases. Mn-N compounds, such as Mn6N2.58 and Mn3N2, decreased and the resistivity significantly increased, meaning a reduction of N vacancies. It is suggested that enhancement in ferromagnetic properties in the (Mn+N)-implanted GaN originated from the reduction of N vacancies and the increase of Ga-Mn magnetic phases. (C) 2004 American Institute of Physics.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleEnhancement of magnetic properties by nitrogen implantation to Mn-implanted p-type GaN-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1063/1.1647282-
dc.author.googleBaik, JMen_US
dc.author.googleShon, Yen_US
dc.author.googleLee, JLen_US
dc.author.googleKang, TWen_US
dc.relation.volume84en_US
dc.relation.issue7en_US
dc.relation.startpage1120en_US
dc.relation.lastpage1122en_US
dc.contributor.id10105416en_US
dc.relation.journalAPPLIED PHYSICS LETTERSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.84, no.7, pp.1120 - 1122-
dc.identifier.wosid000188880000031-
dc.date.tcdate2019-01-01-
dc.citation.endPage1122-
dc.citation.number7-
dc.citation.startPage1120-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume84-
dc.contributor.affiliatedAuthorLee, JL-
dc.identifier.scopusid2-s2.0-1542469554-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc31-
dc.description.scptc33*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordPlusMOLECULAR-BEAM EPITAXY-
dc.subject.keywordPlus(GA,MN)N-
dc.subject.keywordPlusNITRIDE-
dc.subject.keywordPlusFILMS-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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