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Electron beam lithography overlay process with sub-20nm accuracy for 3D metamaterials and metadevices
- Title
- Electron beam lithography overlay process with sub-20nm accuracy for 3D metamaterials and metadevices
- Authors
- KIM, INKI; RHO, JUNSUK
- Date Issued
- 2018-04-23
- Publisher
- PCS IBS
- Article Type
- Conference
- Citation
- International Workshop Meta-Optics and Metamaterials, 2018-04-23
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Related Researcher
- 노준석RHO, JUNSUK
- Dept of Mechanical Enginrg