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Cited 4 time in webofscience Cited 6 time in scopus
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dc.contributor.authorLee, S-
dc.contributor.authorSon, JH-
dc.contributor.authorJung, GH-
dc.contributor.authorKim, YG-
dc.contributor.authorKim, CY-
dc.contributor.authorYoon, YJ-
dc.contributor.authorLee, JL-
dc.date.accessioned2015-06-25T01:17:08Z-
dc.date.available2015-06-25T01:17:08Z-
dc.date.created2009-02-28-
dc.date.issued2007-11-26-
dc.identifier.issn0003-6951-
dc.identifier.other2015-OAK-0000007338en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/9573-
dc.description.abstractWe report a metallization scheme of high-reflectance low-resistance Ohmic contact on p-type GaN. The high reflectance of 84% at 460 nm wavelength and the specific contact resistivity as low as 8.59x10(-6) Omega cm(2) were obtained from MgAl-alloy(50 A)/Ag(3000 A)/Ru(500 A) annealed at 450 degrees C in air. The formation of Ag-Ga solid solution due to the outdiffusion of Ga after annealing leads to an Ohmic behavior of the contact. Employing highly reflective MgAl as a contact layer and Ru as an overlayer that suppress the agglomeration and the oxidation of the Ag result in the high reflectance of the contact. (C) 2007 American Institute of Physics.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleHighly reflective MgAl alloy/Ag/Ru Ohmic contact with low contact resistivity on p-type GaN-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1063/1.2820877-
dc.author.googleLee, Sen_US
dc.author.googleSon, JHen_US
dc.author.googleLee, JLen_US
dc.author.googleYoon, YJen_US
dc.author.googleKim, CYen_US
dc.author.googleKim, YGen_US
dc.author.googleJung, GHen_US
dc.relation.volume91en_US
dc.relation.issue22en_US
dc.contributor.id10105416en_US
dc.relation.journalAPPLIED PHYSICS LETTERSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.91, no.22-
dc.identifier.wosid000251324600050-
dc.date.tcdate2019-01-01-
dc.citation.number22-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume91-
dc.contributor.affiliatedAuthorLee, JL-
dc.identifier.scopusid2-s2.0-36549033229-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc4-
dc.description.scptc6*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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