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Cited 14 time in webofscience Cited 16 time in scopus
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dc.contributor.authorYou, SJ-
dc.contributor.authorPark, GY-
dc.contributor.authorKwon, JH-
dc.contributor.authorKim, JH-
dc.contributor.authorChang, HY-
dc.contributor.authorLee, JK-
dc.contributor.authorSeong, DJ-
dc.contributor.authorShin, YH-
dc.date.accessioned2015-06-25T01:25:22Z-
dc.date.available2015-06-25T01:25:22Z-
dc.date.created2010-12-02-
dc.date.issued2010-03-08-
dc.identifier.issn0003-6951-
dc.identifier.other2015-OAK-0000022224en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/9701-
dc.description.abstractThe evolution of electron temperature in a low pressure magnetized capacitive discharge was investigated under the collisionless electron heating regime. The results showed that while the electron temperature increases monotonously with the magnetic field in previous study [Turner et al., Phys. Rev. Lett. 76, 2069(1996)], the electron temperature in our experiment exhibited nonmonotonic evolution behavior with the magnetic field. This nonmonotonic evolution of the electron temperature with the magnetic field was shown to be a combined effect of suppressing electron resonance heating and enhancing collisional heating while increasing the magnetic field. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3309589]-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleEvolution of electron temperature in low pressure magnetized capacitive plasma-
dc.typeArticle-
dc.contributor.college전자전기공학과en_US
dc.identifier.doi10.1063/1.3309589-
dc.author.googleYou, S. J.en_US
dc.author.googlePark, G. Y.en_US
dc.author.googleShin, Y. H.en_US
dc.author.googleSeong, D. J.en_US
dc.author.googleLee, J. K.en_US
dc.author.googleChang, H. Y.en_US
dc.author.googleKim, J. H.en_US
dc.author.googleKwon, J. H.en_US
dc.relation.volume96en_US
dc.relation.issue10en_US
dc.relation.startpage101504en_US
dc.relation.lastpage101506en_US
dc.contributor.id10158178en_US
dc.relation.journalAPPLIED PHYSICS LETTERSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.96, no.10, pp.101504 - 101506-
dc.identifier.wosid000275588000022-
dc.date.tcdate2019-01-01-
dc.citation.endPage101506-
dc.citation.number10-
dc.citation.startPage101504-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume96-
dc.contributor.affiliatedAuthorLee, JK-
dc.identifier.scopusid2-s2.0-77949726564-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc6-
dc.description.scptc7*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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