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Cited 24 time in webofscience Cited 22 time in scopus
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dc.contributor.authorChung, Y-
dc.contributor.authorJohnson, O-
dc.contributor.authorDeal, M-
dc.contributor.authorNishi, Y-
dc.contributor.authorMurmann, B-
dc.contributor.authorBao, ZA-
dc.date.accessioned2015-06-25T01:27:14Z-
dc.date.available2015-06-25T01:27:14Z-
dc.date.created2015-02-09-
dc.date.issued2012-08-
dc.identifier.issn0003-6951-
dc.identifier.other2015-OAK-0000031860en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/9732-
dc.description.abstractFor practical applications of organic field-effect transistors (OFETs), the control of threshold voltage (V-TH) is important as different circuits require different electrical characteristics. Here, we demonstrate two types of gate electrode structures to achieve this control, namely, via dual-metal gates and bilayer metal gates. The first approach uses different metallic materials, titanium, and platinum, while the second approach uses different thicknesses in a metal bilayer composed of aluminum and platinum. Our results show that the VTH is varied by more than 20% of the supply voltage without affecting the field-effect mobility values for both pentacene p-channel and C-60 n-channel OFETs. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4739511]-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAIP Publishing-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleEngineering the Metal Gate Electrode for Controlling the Threshold Voltage of Organic Transistors-
dc.typeArticle-
dc.contributor.college전자전기공학과en_US
dc.identifier.doi10.1063/1.4739511-
dc.author.googleChung, Yen_US
dc.author.googleJohnson, Oen_US
dc.author.googleBao, ZAen_US
dc.author.googleMurmann, Ben_US
dc.author.googleNishi, Yen_US
dc.author.googleDeal, Men_US
dc.relation.volume101en_US
dc.relation.issue6en_US
dc.relation.startpage63304en_US
dc.contributor.id11087558en_US
dc.relation.journalApplied Physics Lettersen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.101, no.6, pp.63304-
dc.identifier.wosid000307862400089-
dc.date.tcdate2019-01-01-
dc.citation.number6-
dc.citation.startPage63304-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume101-
dc.contributor.affiliatedAuthorChung, Y-
dc.identifier.scopusid2-s2.0-84865142656-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc14-
dc.description.scptc15*
dc.date.scptcdate2018-10-274*
dc.description.isOpenAccessN-
dc.type.docTypeArticle-
dc.subject.keywordPlusSELF-ASSEMBLED MONOLAYERS-
dc.subject.keywordPlusDENSITY-
dc.subject.keywordPlusSHIFT-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-

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정윤영CHUNG, YOONYOUNG
Dept of Electrical Enginrg
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