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dc.contributor.authorLee, Sen_US
dc.contributor.authorWoo, Jen_US
dc.contributor.author황현상en_US
dc.contributor.authorHwang, Hen_US
dc.contributor.authorKoo, Yen_US
dc.contributor.authorSong, Jen_US
dc.contributor.authorMoon, Ken_US
dc.contributor.authorPark, Jen_US
dc.contributor.authorCha, Een_US
dc.contributor.authorLee, Den_US
dc.date.accessioned2015-06-25T01:31:11Z-
dc.date.available2015-06-25T01:31:11Z-
dc.date.issued2014-02en_US
dc.identifier.issn0003-6951en_US
dc.identifier.other2015-OAK-0000029036en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/9796-
dc.description.abstractIn this study, the effect of the oxygen profile and thickness of multiple-layers TiOx on tunnel barrier characteristics was investigated to achieve high non-linearity in low-resistance state current (I-LRS). To form the tunnel barrier in multiple-layer of TiOx, tunnel barrier engineering in terms of the thickness and oxygen profile was attempted using deposition and thermal oxidation times. It modified the defect distribution of the tunnel barrier for effective suppression of ILRS at off-state (1/2V(Read)). By inserting modified tunnel barrier in resistive random access memory, a high non-linear I-LRS was exhibited with a significantly lowered I-LRS for 1/2V(Read). (C) 2014 AIP Publishing LLC.en_US
dc.description.statementofresponsibilityopenen_US
dc.format.extentpdfen_US
dc.publisherAmerican Institute of Physics Inc..en_US
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleTunnel Barrier Engineering of Titanium Oxide for High Non-Linearity of Selector-less Resistive Random Access Memoryen_US
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1063/1.4864471en_US
dc.author.googleLee, Sen_US
dc.author.googleWoo, Jen_US
dc.author.googleHwang, Hen_US
dc.author.googleKoo, Yen_US
dc.author.googleSong, Jen_US
dc.author.googleMoon, Ken_US
dc.author.googlePark, Jen_US
dc.author.googleCha, Een_US
dc.author.googleLee, Den_US
dc.relation.volume104en_US
dc.relation.issue5en_US
dc.relation.startpage52108en_US
dc.contributor.id10079928en_US
dc.publisher.locationUSen_US
dc.relation.journalApplied Physics Lettersen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.docTypeArticle-

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