Article
Cited 10 time in 
Cited 10 time in 
Cited 10 time in
Metadata Downloads
An Inorganic-Organic Diblock Copolymer Photoresist for Direct Mesoporous SiCN Ceramic Patterns via Photolithography SCIE SCOPUS
- Title
- An Inorganic-Organic Diblock Copolymer Photoresist for Direct Mesoporous SiCN Ceramic Patterns via Photolithography
- Authors
- Chi, TN; Phan, HH; Perumal, J; Kim, DP
- Date Issued
- 2011-03
- Publisher
- ROYAL SOC CHEMISTRY
- Abstract
- A high resolution negative-tone-type of inorganic-organic diblock copolymer photoresist was synthesized as a novel precursor for simple and direct fabrication of SiCN ceramic mesoporous patterns with ordered nanoscale pores by using a "top-down" photolithographic technique and the subsequent sacrificial processes of a "bottom-up" self-assembled nanostructure.
- ISSN
- 1359-7345
- Article Type
- Article
- Citation
- CHEMICAL COMMUNICATIONS, vol. 47, no. 12, page. 3484 - 3486, 2011-03
- Files in This Item:
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
Communities & Collection
Related Researcher
- 김동표KIM, DONG PYO
- Dept. of Chemical Enginrg