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PARK, CHAN GYUNG(박찬경)
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Dept of Materials Science & Engineering(신소재공학과)
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Publication & Time Cited Count (For the Last 5 years)
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Date issued
2016
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CAPACITANCE
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DIELECTRICS
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GROWTH
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HYDROGEN PLASMA
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PASSIVATION
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SURFACE-ROUGHNESS
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Article
Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal–insulator–metal applications
SCIE
SCOPUS
Japanese Journal of Applied Physics, vol. 55, no. 1, 2016-01
Choi, KK
;
Park, CG
;
Kim, DK
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