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Article
Characterization of Near-Interface Oxide Trap Density in Nitrided Oxides for Nano-Scale MOSFET ApplicationsSCIESCOPUS

IEEE TRANSACTIONS ON NANOTECHNOLOGY, vol. 8, no. 5, page. 654 - 658, 2009-09

Article
Comparison of La-based high-k dielectrics: HfLaSiON and HfLaONSCIESCOPUS

MICROELECTRONIC ENGINEERING, vol. 86, no. 3, page. 268 - 271, 2009-03

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