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전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

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Article

Comparison of La-based high-k dielectrics: HfLaSiON and HfLaONSCIESCOPUS

MICROELECTRONIC ENGINEERING, vol. 86, no. 3, page. 268 - 271, 2009-03

Article

Time-Dependent Dielectric Breakdown of La2O3-Doped High-k/Metal Gate Stacked NMOSFETsSCIESCOPUS

IEEE ELECTRON DEVICE LETTERS, vol. 30, no. 3, page. 298 - 301, 2009-03

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