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DEPTH PROFILES OF VACANCY-TYPE DEFECT IN SI+-IMPLANTED GAAS RESULTING FROM RAPID THERMAL ANNEALING SCIE SCOPUS

Title
DEPTH PROFILES OF VACANCY-TYPE DEFECT IN SI+-IMPLANTED GAAS RESULTING FROM RAPID THERMAL ANNEALING
Authors
KIM, JSLEE, JLMA, DSPARK, HMSHIM, KHTANIGAWA, SUEDONO, A
Date Issued
1989-01-01
Publisher
AMER INST PHYSICS
URI
https://oasis.postech.ac.kr/handle/2014.oak/10437
DOI
10.1063/1.342559
ISSN
0021-8979
Article Type
Article
Citation
JOURNAL OF APPLIED PHYSICS, vol. 65, no. 1, page. 396 - 397, 1989-01-01
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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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