pH dependence of synchrotron x-ray induced electroless nickel deposition
SCIE
SCOPUS
- Title
- pH dependence of synchrotron x-ray induced electroless nickel deposition
- Authors
- Borse, PH; Yi, JM; Je, JH; Tsai, WL; Hwu, Y
- Date Issued
- 2004-02-01
- Publisher
- AMER INST PHYSICS
- Abstract
- We investigated the room temperature electroless nickel deposition on glass, induced by synchrotron x ray. By irradiating electrolytes with intense x ray the onset time for Ni reduction disappears at high electrolyte pH (>6.0) in sharp contrast with conventional electroless deposition. The time for Ni reduction in irradiated solution also decreases with increase in electrolyte pH. Consequently higher reduction rates in alkaline solutions (pH>8.0) raise the Ni nucleation density during deposition, as illustrated by homogeneous and complete coverage of the substrate by nanoparticles within a short period of 1 min. The enhancement in reduction rate is attributed to high redox efficiency of hydrated electrons produced by x ray as well as their redox potential enhancements under higher electrolyte pH conditions. (C) 2004 American Institute of Physics.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/10549
- DOI
- 10.1063/1.1637724
- ISSN
- 0021-8979
- Article Type
- Article
- Citation
- JOURNAL OF APPLIED PHYSICS, vol. 95, no. 3, page. 1166 - 1170, 2004-02-01
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