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Channel Trimming Process to Improve Electro-thermal Characteristics for Sub-3-nm Node Nanosheet Field-Effect Transistors with Laser Spike Annealing

Title
Channel Trimming Process to Improve Electro-thermal Characteristics for Sub-3-nm Node Nanosheet Field-Effect Transistors with Laser Spike Annealing
Authors
BAEK, ROCK HYUN이상욱정진수이승환S. Lee임재완S. C. SongS. EkboteN. Stevens-YuD. Greenlaw
Date Issued
2023-09-08
Publisher
2023 SSDM
URI
https://oasis.postech.ac.kr/handle/2014.oak/119823
Article Type
Conference
Citation
2023 International Conference on Solid State Devices and Materials (SSDM), 2023-09-08
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백록현BAEK, ROCK HYUN
Dept of Electrical Enginrg
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