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BCl3/Cl2 plasma etching process of ferroelectric gate stack for device integration
- Title
- BCl3/Cl2 plasma etching process of ferroelectric gate stack for device integration
- Date Issued
- 2023-02-15
- Publisher
- KCS
- Article Type
- Conference
- Citation
- 제 30회 한국반도체학술대회, 2023-02-15
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Related Researcher
- 백록현BAEK, ROCK HYUN
- Dept of Electrical Enginrg