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PEALD with Post-treatments for Interface Improvement of HfO2-based Metal-Insulator-Semiconductor Structures
- Title
- PEALD with Post-treatments for Interface Improvement of HfO2-based Metal-Insulator-Semiconductor Structures
- Authors
- BAEK, ROCK HYUN; 박종서; 최경근; 강보현; 안제현
- Date Issued
- 2022-01-25
- Publisher
- KCS
- Article Type
- Conference
- Citation
- 제 29회 한국반도체학술대회, 2022-01-25
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Related Researcher
- 백록현BAEK, ROCK HYUN
- Dept of Electrical Enginrg