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Hydrogen Plasma-Assisted Atomic Layer Deposition of Ru with Low Oxygen Content SCIE KCI
- Title
- Hydrogen Plasma-Assisted Atomic Layer Deposition of Ru with Low Oxygen Content
- Date Issued
- 2024-02
- Publisher
- 한국화학공학회
- ISSN
- 0256-1115
- Article Type
- Article
- Citation
- Korean Journal of Chemical Engineering, 2024-02
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