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Superior retention (>1 year, 85 °C) and memory window (~1.8 V) using ultra-thin HZO FTJ with OTS selector for X-point memory applications

Title
Superior retention (>1 year, 85 °C) and memory window (~1.8 V) using ultra-thin HZO FTJ with OTS selector for X-point memory applications
Authors
LAE, YONG JUNGJANGSEOP, LEEOH, SEUNGYEOLHwang, Hyunsang
Date Issued
2023-12-12
Publisher
Institute of Electrical and Electronics Engineers Inc.
Abstract
We present excellent nonvolatile memoiy characteristics using an ultra-thin Hf
URI
https://oasis.postech.ac.kr/handle/2014.oak/121006
Article Type
Conference
Citation
2023 International Electron Devices Meeting, IEDM 2023, 2023-12-12
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