Electrical characteristics of 20-nm junctionless Si nanowire transistors
SCIE
SCOPUS
- Title
- Electrical characteristics of 20-nm junctionless Si nanowire transistors
- Authors
- Park, CH; Ko, MD; Kim, KH; Baek, RH; Sohn, CW; BAEK, CHANG KI; Park, S; Deen, MJ; JEONG, YOON HA; LEE, JEONG SOO
- Date Issued
- 2012-07
- Publisher
- Elsevier
- Abstract
- We have fabricated n-channel junctionless nanowire transistors with gate lengths in the range of 20-250 nm, and have compared their electrical performances with conventional inversion-mode nanowire transistors. The junctionless tri-gate transistor with a gate length of 20 urn showed excellent electrical characteristics with a high I-on/I-off ratio (>10(6)), good subthreshold slope (similar to 79 mV/dec), and low drain-induced barrier lowering (similar to 10 mV/V). The simpler fabrication process without junction formation results in improved short-channel characteristics compared to the inversion-mode devices, and also makes the junctionless nanowire transistor a promising candidate for sub 22-nm technology nodes. (C) 2012 Elsevier Ltd. All rights reserved.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/14735
- DOI
- 10.1016/J.SSE.2011.11.032
- ISSN
- 0038-1101
- Article Type
- Article
- Citation
- Solid State Electronics, vol. 73, page. 7 - 10, 2012-07
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- There are no files associated with this item.
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