Acrylation of polyvinylsilazane with allyl bromide for an UV photosensitive inorganic polymer

Abstract

novel inorganic polymer resin with high photosensitivity was prepared by grafting acrylate functional groups onto the backbone of polyvinylsilazane through a reaction with methyl-2-(bromo-methyl)acrylate via the highly efficient electrophilic substitution of allyl bromide. The as-modified polymer was characterized by H-1 NMR and 2D-H-1-H-1 NMR (COSY) methods to determine the reaction mechanism. Differential photocalorimetry, FT-IR spectroscopy and TGA were used to examine its properties. The modified polyvinylsilazane is a promising inorganic polymer photoresist with a high UV sensitivity and a 55% ceramic yield, which is useful for fabricating nonoxide ceramic microstructures using mold free photocuring shaping processes. (c) 2007 Elsevier B.V. All rights reserved.