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The formation of SiGaN/SiOxNy nanocables and SiOxNy-based nanostructures using GaN as a resource of Ga SCIE SCOPUS

Title
The formation of SiGaN/SiOxNy nanocables and SiOxNy-based nanostructures using GaN as a resource of Ga
Authors
Xu, CKKim, MChung, SYChun, JKim, DE
Date Issued
2004-11-01
Publisher
ELSEVIER SCIENCE BV
Abstract
SiGaN/SiOxNy nanocables and SiOxNy-based nanostructures on silicon and silica substrates, respectively, have been firstly synthesized via using GaN as a resource of Ga. The silica wafer is mainly responsible for the formation of SiOxNy-based nanostructures and the intermediate Ga plays an important role in the formation of diverse nanostructures. SEM, TEM, line scan and SAED were employed to characterize as-prepared samples. The growth mechanism of as-prepared samples is also discussed. (C) 2004 Elsevier B.V. All rights reserved.
Keywords
LIQUID-PHASE EPITAXY; SILICON; NANOWIRES; THIN; SIO2; N2O; PHOTOLUMINESCENCE; OXYNITRIDES; GROWTH
URI
https://oasis.postech.ac.kr/handle/2014.oak/17643
DOI
10.1016/j.cplett.2004.09.066
ISSN
0009-2614
Article Type
Article
Citation
CHEMICAL PHYSICS LETTERS, vol. 398, no. 1-3, page. 264 - 269, 2004-11-01
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