DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, SY | - |
dc.contributor.author | Hur, SM | - |
dc.contributor.author | Kim, HJ | - |
dc.contributor.author | Yoon, CS | - |
dc.contributor.author | Lee, YT | - |
dc.contributor.author | Kang, IY | - |
dc.contributor.author | Chung, YC | - |
dc.contributor.author | Yi, M | - |
dc.contributor.author | Bok, CK | - |
dc.contributor.author | Kim, O | - |
dc.contributor.author | Ahn, J | - |
dc.date.accessioned | 2016-03-31T13:03:15Z | - |
dc.date.available | 2016-03-31T13:03:15Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2002-06 | - |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.other | 2002-OAK-0000002807 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/18964 | - |
dc.description.abstract | Mo/Si multilayers deposited by sputtering for application to extreme-ultraviolet (EUV) reflectors have been characterized. Si rice the control of d-spacing is critical for achieving higher reflectivity. an effective and accurate d-spacing measurement technology is required. Although cross-sectional transmission electron microscope (TEM) and low-angle X-ray diffraction (XRD) are standard methods for evaluating multilayers. they provide different d-spacing values front each other. Cross-sectional TIN images can allow direct measurement of individual layers and cannot reveal tire optical behavior of the multilayer. On the other hand, low-angle XRD analysis can provide the resultant d-spacing which includes nonideal factors. As a result look-angle XRD can predict the EUV peak position more precisely than TEM analysis. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | INST PURE APPLIED PHYSICS | - |
dc.relation.isPartOf | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | - |
dc.subject | EUVL | - |
dc.subject | NGL | - |
dc.subject | Mo/Si | - |
dc.subject | multilayer | - |
dc.subject | reflectivity | - |
dc.subject | d-spacing | - |
dc.subject | RESOLUTION ELECTRON-MICROSCOPY | - |
dc.subject | MO-SI MULTILAYER | - |
dc.subject | LITHOGRAPHY | - |
dc.subject | MIRRORS | - |
dc.title | Analysis of multilayer structure for reflection of extreme-ultraviolet wavelength | - |
dc.type | Article | - |
dc.contributor.college | 전자전기공학과 | - |
dc.identifier.doi | 10.1143/JJAP.41.4086 | - |
dc.author.google | Lee, SY | - |
dc.author.google | Hur, SM | - |
dc.author.google | Kim, HJ | - |
dc.author.google | Yoon, CS | - |
dc.author.google | Lee, YT | - |
dc.author.google | Kang, IY | - |
dc.author.google | Chung, YC | - |
dc.author.google | Yi, M | - |
dc.author.google | Bok, CK | - |
dc.author.google | Kim, O | - |
dc.author.google | Ahn, J | - |
dc.relation.volume | 41 | - |
dc.relation.issue | 6B | - |
dc.relation.startpage | 4086 | - |
dc.relation.lastpage | 4090 | - |
dc.contributor.id | 10087230 | - |
dc.relation.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Conference Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.41, no.6B, pp.4086 - 4090 | - |
dc.identifier.wosid | 000177169700013 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 4090 | - |
dc.citation.number | 6B | - |
dc.citation.startPage | 4086 | - |
dc.citation.title | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | - |
dc.citation.volume | 41 | - |
dc.contributor.affiliatedAuthor | Kim, O | - |
dc.identifier.scopusid | 2-s2.0-0036613993 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 7 | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.subject.keywordPlus | RESOLUTION ELECTRON-MICROSCOPY | - |
dc.subject.keywordPlus | MO-SI MULTILAYER | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | MIRRORS | - |
dc.subject.keywordAuthor | EUVL | - |
dc.subject.keywordAuthor | NGL | - |
dc.subject.keywordAuthor | Mo/Si | - |
dc.subject.keywordAuthor | multilayer | - |
dc.subject.keywordAuthor | reflectivity | - |
dc.subject.keywordAuthor | d-spacing | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
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