DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, JY | - |
dc.contributor.author | Kwak, KS | - |
dc.contributor.author | Kim, JS | - |
dc.contributor.author | Kang, B | - |
dc.contributor.author | Kwon, O | - |
dc.date.accessioned | 2016-03-31T13:15:52Z | - |
dc.date.available | 2016-03-31T13:15:52Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2001-07 | - |
dc.identifier.issn | 1071-1023 | - |
dc.identifier.other | 2001-OAK-0000002142 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/19436 | - |
dc.description.abstract | This article presents an etching process to fabricate a high-quality vertical facet for the photonic quantum ring (PQR) laser. The presented process uses the chemically assisted ion beam etching (CAIBE) method with a gas mixture of Ar:Cl-2:BCl3=5:2:3 sccm, and uses a single-layer photoresist etch mask to reduce the process complexity of etching GaAs/AlGaAs structures for the PQR laser. The angle theta between the incident beam and the normal direction of the substrate has been adjusted to achieve a high-quality vertical facet. Distortions on the mask pattern are not transferred to the etched side wall for theta greater than or equal to 25 degrees, and a vertical facet is obtained at theta similar to 25 degrees. The fabricated PQR lasers with the CAIBE process in this article show a sharp linewidth of similar to 0.06 nm. (C) 2001 American Vacuum Society. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.relation.isPartOf | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-AN INTERNATIONAL JOURNAL DEVOTED TO MICROELECTRONICS AND NANOMETER STRUCTURES-PROCESSING MEASUREMENT AND PHENOMENA | - |
dc.subject | MICRODISK LASERS | - |
dc.title | Fabrication of photonic quantum ring laser using chemically assisted ion beam etching | - |
dc.type | Article | - |
dc.contributor.college | 전자전기공학과 | - |
dc.identifier.doi | 10.1116/1.1382872 | - |
dc.author.google | Kim, JY | - |
dc.author.google | Kwak, KS | - |
dc.author.google | Kim, JS | - |
dc.author.google | Kang, B | - |
dc.author.google | Kwon, O | - |
dc.relation.volume | 19 | - |
dc.relation.issue | 4 | - |
dc.relation.startpage | 1334 | - |
dc.relation.lastpage | 1338 | - |
dc.contributor.id | 10071834 | - |
dc.relation.journal | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-AN INTERNATIONAL JOURNAL DEVOTED TO MICROELECTRONICS AND NANOMETER STRUCTURES-PROCESSING MEASUREMENT AND PHENOMENA | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-AN INTERNATIONAL JOURNAL DEVOTED TO MICROELECTRONICS AND NANOMETER STRUCTURES-PROCESSING MEASUREMENT AND PHENOMENA, v.19, no.4, pp.1334 - 1338 | - |
dc.identifier.wosid | 000170598400033 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 1338 | - |
dc.citation.number | 4 | - |
dc.citation.startPage | 1334 | - |
dc.citation.title | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-AN INTERNATIONAL JOURNAL DEVOTED TO MICROELECTRONICS AND NANOMETER STRUCTURES-PROCESSING MEASUREMENT AND PHENOMENA | - |
dc.citation.volume | 19 | - |
dc.contributor.affiliatedAuthor | Kang, B | - |
dc.contributor.affiliatedAuthor | Kwon, O | - |
dc.identifier.scopusid | 2-s2.0-0035535268 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 23 | - |
dc.type.docType | Article | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Physics | - |
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