Fabrication of photonic quantum ring laser using chemically assisted ion beam etching
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SCOPUS
- Title
- Fabrication of photonic quantum ring laser using chemically assisted ion beam etching
- Authors
- Kim, JY; Kwak, KS; Kim, JS; Kang, B; Kwon, O
- Date Issued
- 2001-07
- Publisher
- AMER INST PHYSICS
- Abstract
- This article presents an etching process to fabricate a high-quality vertical facet for the photonic quantum ring (PQR) laser. The presented process uses the chemically assisted ion beam etching (CAIBE) method with a gas mixture of Ar:Cl-2:BCl3=5:2:3 sccm, and uses a single-layer photoresist etch mask to reduce the process complexity of etching GaAs/AlGaAs structures for the PQR laser. The angle theta between the incident beam and the normal direction of the substrate has been adjusted to achieve a high-quality vertical facet. Distortions on the mask pattern are not transferred to the etched side wall for theta greater than or equal to 25 degrees, and a vertical facet is obtained at theta similar to 25 degrees. The fabricated PQR lasers with the CAIBE process in this article show a sharp linewidth of similar to 0.06 nm. (C) 2001 American Vacuum Society.
- Keywords
- MICRODISK LASERS
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/19436
- DOI
- 10.1116/1.1382872
- ISSN
- 1071-1023
- Article Type
- Article
- Citation
- JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-AN INTERNATIONAL JOURNAL DEVOTED TO MICROELECTRONICS AND NANOMETER STRUCTURES-PROCESSING MEASUREMENT AND PHENOMENA, vol. 19, no. 4, page. 1334 - 1338, 2001-07
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