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Iron-oxide interlayer existing in Ba-ferrite/sapphire(001) films grown by sputtering SCIE SCOPUS

Title
Iron-oxide interlayer existing in Ba-ferrite/sapphire(001) films grown by sputtering
Authors
Cho, TSDoh, SJJe, JHNoh, DY
Date Issued
1999-01
Publisher
JAPAN J APPLIED PHYSICS
Abstract
We revealed the existence of a very thin (similar to 50 Angstrom thick) epitaxial. iron-oxide interlayer in amorphous Ba-ferrite thin films on sapphire(001) using synchrotron x-ray scattering. Depending on the sputtering gases used in radio frequency sputtering deposition, two different iron-oxide interlayers were formed; non-magnetic alpha-Fe2O3 interlayer by pure Ar gas and ferromagnetic Fe3O4 interlayer by Ar-10% O-2 gas mixture. The alpha-Fe2O3 interlayer much more promoted the crystallization of amorphous Ba-ferrite, compared to the Fe3O4 interlayer. We suggest that the interlayer existing between amorphous Ba-ferrite and sapphire substrate greatly contributes to the reduction of the activation energy for the crystallization of amorphous Baferrite film.
Keywords
epitaxial Ba-ferrite film; iron-oxide interlayer; rf magnetron sputtering; synchrotron x-ray scattering; FERRITE FILMS; MAGNETIC CHARACTERISTICS; MEDIA; INPLANE; MIXTURE; O-2; AR; XE
URI
https://oasis.postech.ac.kr/handle/2014.oak/20263
DOI
10.7567/JJAPS.38S1.444
ISSN
0021-4922
Article Type
Article
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, vol. 38, page. 444 - 447, 1999-01
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제정호JE, JUNG HO
Dept of Materials Science & Enginrg
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