Vertical Density Profiles of Various Photoresists and Top-coats by X-ray Reflectivity Analysis

Abstract

Vertical electron density profiles of various photoresist, top-coat and their combinations as bilayers were obtained from X-ray reflectivity analysis. The result suggests that there are specific layers with different electron density near the surface of photoresists and top-coats films. The investigation on bilayer films which consist of photoresist and top-coat shows that the intermixing of two materials and the roughness of films are varied by annealing (baking) time and temperature.