Implementation of sub-Rayleigh-resolution lithography using an N-photon absorber
SCIE
SCOPUS
- Title
- Implementation of sub-Rayleigh-resolution lithography using an N-photon absorber
- Authors
- Chang, HJ; Shin, H; O'Sullivan-Hale, MN; Boyd, RW
- Date Issued
- 2006-11-10
- Publisher
- Taylor & Francis
- Abstract
- A nonlinear optical, phase-shifted-grating method for improving the resolution of feature sizes is implemented experimentally using an N-photon lithographic material. For the recording medium, we used poly(methyl-methacrylate) (PMMA), which is a UV lithographic material that can be excited by multi-photon absorption in the visible region. We achieved a two-fold enhancement of the resolution over the standard Rayleigh limit of half of the wavelength.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/26639
- DOI
- 10.1080/09500340600895656
- ISSN
- 0950-0340
- Article Type
- Article
- Citation
- JOURNAL OF MODERN OPTICS, vol. 53, no. 6, page. 2271 - 2277, 2006-11-10
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